Selective deposition of polystyrene nanoparticles in a nanoetchpit array on a silicon substrate
Literature Information
Publication Date
2004-03-16
DOI
10.1039/B315816K
Impact Factor
6.222
Authors
Manabu Tanaka, Takumi Hosaka, Takashi Tanii, Iwao Ohdomari, Hiroyuki Nishide
View Original
Abstract
Nanometer-sized polystyrene particles were selectively deposited by interfacial tension in nanometer-sized etchpit arrays made on a silicon substrate.
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Source Journal
Chemical Communications
CiteScore:
8.6
Self-citation Rate:
4.7%
Articles per Year:
2458
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Recommended Compounds
![1-{3-[4-Amino-3-(4-phenoxyphenyl)-1H-pyrazolo[3,4-d]pyrimidin-1-yl]-1-piperidinyl}-2,3-dihydroxy-1-propanone structure](https://static.chemtradehub.com/structs/122/1226872-27-0-e037.webp "1-{3-[4-Amino-3-(4-phenoxyphenyl)-1H-pyrazolo[3,4-d]pyrimidin-1-yl]-1-piperidinyl}-2,3-dihydroxy-1-propanone structure")
1-{3-[4-Amino-3-(4-phenoxyphenyl)-1H-pyrazolo[3,4-d]pyrimidin-1-yl]-1-piperidinyl}-2,3-dihydroxy-1-propanone
CAS Number:
1226872-27-0
Molecular Formula:
C25H26N6O4
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