Selective formation mechanisms of quantum dots on patterned substrates
Literature Information
Xinlei Li
We have presented a theoretical model to elucidate the formation mechanisms of quantum dots (QDs) on patterned substrates, which introduced the perspective that the preferred formation site of QDs is determined by the nonuniformity of wetting layer thickness caused by surface potential. Two different preferred formation sites, low surface curvature or high surface curvature, can be switched through controlling growth temperature or selecting appropriate patterns. The model explains some interesting and puzzling experimental observations, which implies that the established approach could be applicable to the physical understanding of the QDs on patterned substrates.
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Physical Chemistry Chemical Physics (PCCP) is an international journal co-owned by 19 physical chemistry and physics societies from around the world. This journal publishes original, cutting-edge research in physical chemistry, chemical physics and biophysical chemistry. To be suitable for publication in PCCP, articles must include significant innovation and/or insight into physical chemistry; this is the most important criterion that reviewers and Editors will judge against when evaluating submissions. The journal has a broad scope and welcomes contributions spanning experiment, theory, computation and data science. Topical coverage includes spectroscopy, dynamics, kinetics, statistical mechanics, thermodynamics, electrochemistry, catalysis, surface science, quantum mechanics, quantum computing and machine learning. Interdisciplinary research areas such as polymers and soft matter, materials, nanoscience, energy, surfaces/interfaces, and biophysical chemistry are welcomed if they demonstrate significant innovation and/or insight into physical chemistry. Joined experimental/theoretical studies are particularly appreciated when complementary and based on up-to-date approaches.











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