Inorganic polymer photoresist for direct ceramic patterning by photolithography
Literature Information
Tuan Anh Pham, Pilnam Kim, Moonkyoo Kwak, Kahp Y. Suh, Dong-Pyo Kim
A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 °C.
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![4-Nitrophenyl N-{[(2-methyl-2-propanyl)oxy]carbonyl}-L-isoleucinate structure 4-Nitrophenyl N-{[(2-methyl-2-propanyl)oxy]carbonyl}-L-isoleucinate structure](https://static.chemtradehub.com/structs/169/16948-38-2-c88f.webp)

![4,4'-[2,5-Biphenyldiylbis(oxy)]dianiline structure 4,4'-[2,5-Biphenyldiylbis(oxy)]dianiline structure](https://static.chemtradehub.com/structs/941/94148-67-1-24c6.webp)

![4-(4-{4-[4-Fluoro-3-(trifluoromethyl)phenyl]-1-methyl-1H-imidazol-2-yl}-1-piperidinyl)-1H-pyrazolo[3,4-d]pyrimidine 4-methylbenzenesulfonate (1:1) structure 4-(4-{4-[4-Fluoro-3-(trifluoromethyl)phenyl]-1-methyl-1H-imidazol-2-yl}-1-piperidinyl)-1H-pyrazolo[3,4-d]pyrimidine 4-methylbenzenesulfonate (1:1) structure](https://static.chemtradehub.com/structs/108/1082949-68-5-00b6.webp)