Inorganic polymer photoresist for direct ceramic patterning by photolithography

Literature Information

Publication Date 2007-08-30
DOI 10.1039/B708480C
Impact Factor 6.222
Authors

Tuan Anh Pham, Pilnam Kim, Moonkyoo Kwak, Kahp Y. Suh, Dong-Pyo Kim


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Abstract

A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 °C.

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