UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane)
Literature Information
Alison Y. Cheng, Scott B. Clendenning, Guocheng Yang, Zheng-Hong Lu, Christopher M. Yip, Ian Manners
Thin films of a cobalt-clusterized poly(ferrocenylsilane) have been shown to behave as a negative-tone resist for UV photolithography, allowing access to feature sizes between 20 and 300 µm. Pyrolysis of the patterned polymer at 900 °C under a N2 atmosphere afforded patterned ferromagnetic ceramics with excellent shape retention.
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