Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Literature Information

Publication Date 2004-03-05
DOI 10.1039/B315278B
Impact Factor 6.222
Authors

Guo-Jun Zhang, Takashi Tanii


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Abstract

Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

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