Retarded dopant diffusion by moderated dopant–dopant interactions in Si nanowires
Literature Information
Jongseob Kim, Ki-Ha Hong
The retarded dopant diffusion in Si nanostructures is investigated using the first principles calculation. It is presented that weak dopant–dopant interaction energy (DDIE) in nanostructures is responsible for the suppressed dopant diffusion in comparison with that in bulk Si. The DDIE is significantly reduced as the diameter of the Si nanowire becomes smaller. The mechanical softening and quantum confinement found in nanostructures are the physical origin for the small interaction energy. Reduced dopant–dopant interaction slows down the diffusion process from heavily doped regions to undoped regions. Thus, we suggest that an additional annealing process is indispensable to make a desired dopant profile in the nanoscale semiconductor devices.
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Physical Chemistry Chemical Physics

Physical Chemistry Chemical Physics (PCCP) is an international journal co-owned by 19 physical chemistry and physics societies from around the world. This journal publishes original, cutting-edge research in physical chemistry, chemical physics and biophysical chemistry. To be suitable for publication in PCCP, articles must include significant innovation and/or insight into physical chemistry; this is the most important criterion that reviewers and Editors will judge against when evaluating submissions. The journal has a broad scope and welcomes contributions spanning experiment, theory, computation and data science. Topical coverage includes spectroscopy, dynamics, kinetics, statistical mechanics, thermodynamics, electrochemistry, catalysis, surface science, quantum mechanics, quantum computing and machine learning. Interdisciplinary research areas such as polymers and soft matter, materials, nanoscience, energy, surfaces/interfaces, and biophysical chemistry are welcomed if they demonstrate significant innovation and/or insight into physical chemistry. Joined experimental/theoretical studies are particularly appreciated when complementary and based on up-to-date approaches.












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