Controlled thiol–ene post-polymerization reactions on polyferrocenylsilane homopolymers and block copolymers
Literature Information
Publication Date
2013-02-13
DOI
10.1039/C3PY21129K
Impact Factor
5.582
Authors
Laurent Chabanne, Stefan Pfirrmann, David J. Lunn, Ian Manners
View Original
Abstract
Various thiols were reacted with poly(ferrocenylmethylvinylsilane) (PFMVS) homopolymers using the radical-mediated thiol–ene reaction with a view to preparing metallopolymers with diverse functional groups. Post-polymerization thiol–ene reactions on poly(ferrocenyldimethylsilane)-b-poly(ferrocenylmethylvinylsilane) (PFDMS-b-PFMVS) diblock copolymers with dodecanethiol and octadecanethiol afforded diblocks with a long hexane-soluble block and a short crystalline, hexane-insoluble PFDMS block. The thiol–ene reactions provided sufficient control to allow access to diblocks that were partially substituted, thus leaving vinyl groups that might subsequently be used for further post-polymerization reactions.
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Polymer Chemistry
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