Materials and Manufacturing Processes

Basic Information

Brief Name: MATER MANUF PROCESS
Impact Factor: 4.1
ISSN: 1042-6914
Research Field: ENGINEERING TECHNOLOGY
h-index: 53
Self-citation Rate: 17.1%
Articles per Year: 136

SCI Index Status: Science Citation Index Expanded
Journal Website: https://www.tandfonline.com/journals/lmmp20
Journal Introduction:

Materials and Manufacturing Processes deals with issues that result in better utilization of raw materials and energy, integration of design and manufacturing activities requiring the invention of suitable new manufacturing processes and techniques, unmanned production dependent on efficient and reliable control of various processes including intelligent processing, introduction of new materials in industrial production necessitating new manufacturing process technology, and more. Information is offered in various formats, including research articles, letter reports, review articles, conference papers, applied research, book and conference reviews, and entire issues devoted to symposia. All submitted manuscripts are subject to initial appraisal by the Editors, and, if found suitable for further consideration, to peer review by independent, anonymous expert referees. All peer review is single anonymized and submission is online via ScholarOne Manuscripts. Publication office: Taylor & Francis, Inc., 530 Walnut Street, Suite 850, Philadelphia, PA 19106 Readership: Materials and Manufacturing Processes is essential for manufactures, engineers, and students who need fast accurate data on the most up-to-date technological developments in composites, diamond and related hard coatings, ceramics, metals, polymers, surface modifications technologies, rapid solidification, combustion synthesis, casting, forming, shaping, joining, sintering, mechanical alloying, injection molding, laser processing, and solgel processing.

CiteScore

CiteScore
9
SJR
1.058
SNIP
1.69
Subject Rank Percentile
EngineeringMechanical Engineering
65 / 672 90%

Journal Statistics

Bimonthly
Issues/Year
1 days avg. from submission to first decision 37 days avg. from submission to first post-review decision 9 days avg. from acceptance to online publication
Review Cycle
Article Processing Fee

Submission Information

Submission Website:

http://mc.manuscriptcentral.com/lmmp

Related Articles

In situ non-aqueous nucleation and growth of next generation rare-earth-free permanent magnets

Aoran Xu, George E. Sterbinsky, Dario A. Arena, Ziying Wang, Peter W. Stephens

2014-11-21 Paper

DOI: 10.1039/C4CP04451G

The key role of polymer grafted nanoparticles in the phase miscibility of an LCST mixture

Goutam Prasanna Kar, Avanish Bharati, Priti Xavier, Giridhar Madras, Suryasarathi Bose

2014-09-17 Paper

DOI: 10.1039/C4CP02925A

Revisiting the conundrum of trehalose stabilization

Nidhi Katyal, Shashank Deep

2014-10-28 Paper

DOI: 10.1039/C4CP02914C

Influence of dispersive forces on the final shape of a reverse micelle

I. León, R. Montero, A. Longarte, José A. Fernández

2014-12-02 Paper

DOI: 10.1039/C4CP03667K

Contents list

Front/Back Matter

DOI: 10.1039/C4CP90180K

Chemical imaging of single catalyst particles with scanning μ-XANES-CT and μ-XRF-CT

S. W. T. Price, K. Ignatyev, K. Geraki, M. Basham, J. Filik, N. T. Vo, P. T. Witte, J. F. W. Mosselmans

2014-11-05 Paper

DOI: 10.1039/C4CP04488F

Correction: High throughput first-principles calculations of bixbyite oxides for TCO applications

Nasrin Sarmadian, Rolando Saniz, Bart Partoens, Dirk Lamoen, Kalpana Volety, Guido Huyberechts, Johan Paul

2014-12-01 Correction

DOI: 10.1039/C4CP90183E

Photocatalytic H2 evolution on MoS2–TiO2 catalysts synthesized via mechanochemistry

Qiang Ling, Yanfang Liu, Hua Wang, Yongfa Zhu

2014-11-05 Paper

DOI: 10.1039/C4CP04628E

Origin of surface trap states in CdS quantum dots: relationship between size dependent photoluminescence and sulfur vacancy trap states

Aisea Veamatahau, Bo Jiang, Tom Seifert, Satoshi Makuta, Kay Latham, Masayuki Kanehara, Toshiharu Teranishi

2014-12-05 Paper

DOI: 10.1039/C4CP04761C

You might also like

Compound Q&A

What is Ethyl 3-cyclohexylpropanoate (CAS: 10094-36-7)?

Ethyl 3-cyclohexylpropanoate is a clear, colorless to light yellow liquid with a...

10094-36-7Ethyl 3-cyclohexylpr...
Compound Q&A

How should waste containing 2-(Hydroxymethyl)-5-(methoxycarbonyl)-6-methyl-4-(2-nitrophenyl)nicotinic acid (CAS: 34783-31-8) be handled?

Waste containing 2-(Hydroxymethyl)-5-(methoxycarbonyl)-6-methyl-4-(2-nitrophenyl...

34783-31-82-(Hydroxymethyl)-5-...
Compound Q&A

How should waste containing 2,4,6-Tris(pentafluoroethyl)-1,3,5-triazine (CAS: 858-46-8) be handled?

Waste containing 2,4,6-Tris(pentafluoroethyl)-1,3,5-triazine (CAS: 858-46-8) sho...

858-46-82,4,6-Tris(pentafluo...
Compound Q&A

What precautions should be taken when handling Chloroac-nle-oh (CAS: 56787-36-1)?

When handling Chloroac-nle-oh (CAS: 56787-36-1), it is essential to wear appropr...

56787-36-1Chloroac-nle-oh
Compound Q&A

What industries use Ethyl 6-phenylimidazo[2,1-b][1,3]thiazole-3-carboxylate (CAS: 752244-05-6)?

Ethyl 6-phenylimidazo[2,1-b][1,3]thiazole-3-carboxylate is primarily used in the...

752244-05-6Ethyl 6-phenylimidaz...
Compound Q&A

Are there alternatives to alpha-(2-Bromophenyl)benzylamine (CAS: 55095-15-3) in synthesis?

Alternatives to alpha-(2-Bromophenyl)benzylamine (CAS: 55095-15-3) in synthesis ...

55095-15-3alpha-(2-Bromophenyl...
Compound Q&A

How should waste containing 2-Chloro-5-methoxypyridine (CAS: 139585-48-1) be handled?

Waste containing 2-Chloro-5-methoxypyridine (CAS: 139585-48-1) should be managed...

139585-48-12-Chloro-5-methoxypy...
Compound Q&A

What industries use 1-(4-Methoxyphenyl)-2,5-dimethyl-1H-pyrrole (CAS: 5044-27-9)?

1-(4-Methoxyphenyl)-2,5-dimethyl-1H-pyrrole (CAS: 5044-27-9) is used in various ...

5044-27-91-(4-Methoxyphenyl)-...
Compound Q&A

Are there alternatives to 3-Bromo-5-(N-Boc)aminomethylisoxazole (CAS: 903131-45-3) in synthesis?

There are alternative reagents and compounds that can be used in the synthesis o...

903131-45-33-Bromo-5-(N-Boc)ami...
Compound Q&A

What is Tungsten(IV) oxide (CAS: 12036-22-5)?

Tungsten(IV) oxide, also known as tungsten dioxide, is a chemical compound with ...

12036-22-5Tungsten(IV) oxide
Disclaimer
This page provides academic journal information for reference and research purposes only. We are not affiliated with any journal publishers and do not handle publication submissions. For publication-related inquiries, please contact the respective journal publishers directly.
If you notice any inaccuracies in the information displayed, please contact us at support@chemtradehub.com. We will promptly review and address your concerns.