![1H-Imidazo[4,5-c]pyridine-7-carboxylic acid structure](https://static.chemtradehub.com/structs/123/1234616-39-7-1344.webp "1H-Imidazo[4,5-c]pyridine-7-carboxylic acid structure")
WEIMAS
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WEIMAS Semiconductor Materials (Hefei) Co.,Ltd., established in 2022, is a leading supplier of corematerials for high-end semiconductor photoresist. Our main products include Photo Acid Generator (PAG), BARC resin, PHS resin and Photo initiator(PI), which are the core materials for ArFi/ArF/KrF photoresists used in advanced semiconductor manufacturing process and photoresists in the display panel industry. Our technical specifications are all at theleading level in the industry, which can achieve ppb grade metal impurity control.
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Discover these popular compounds from our database that might interest you.
2,3,6-Tri-O-acetyl-4-O-(2,3,4,6-tetra-O-acetyl-beta-D-galactopyranosyl)-alpha-D-glucopyranosyl bromide
CAS Number:
4753-07-5
Molecular Formula:
C26H35BrO17
BIS(I-PROPYLCYCLOPENTADIENYL)TITANIUM DICHLORIDE
CAS Number:
12130-65-3
Molecular Formula:
C16H22Cl2Ti
![(1R,6R)-6-({[(2-Methyl-2-propanyl)oxy]carbonyl}amino)-3-cyclohexene-1-carboxylic acid structure](https://static.chemtradehub.com/structs/865/865689-24-3-5fef.webp "(1R,6R)-6-({[(2-Methyl-2-propanyl)oxy]carbonyl}amino)-3-cyclohexene-1-carboxylic acid structure")
(1R,6R)-6-({[(2-Methyl-2-propanyl)oxy]carbonyl}amino)-3-cyclohexene-1-carboxylic acid
CAS Number:
865689-24-3
Molecular Formula:
C12H19NO4
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