Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

Literature Information

Publication Date 2021-03-29
DOI 10.1039/D1CP00065A
Impact Factor 3.676
Authors

Maicol Cipriani, Ching-Chung Huang, Lionel Amiaud, Céline Dablemont, Anne Lafosse, Oddur Ingólfsson, Danilo De Simone


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Abstract

Secondary electrons generated during the Extreme Ultraviolet Lithography (EUVL) process are predominantly responsible for inducing important patterning chemistry in photoresist films. Therefore, it is crucial to understand the electron-induced fragmentation mechanisms involved in EUV-resist systems to improve their patterning performance. To facilitate this understanding, mechanistic studies were carried out on simple organic EUV-resist monomers, methyl isobutyrate (MIB) and methacrylic acid (MAA), both in the condensed and gas phases. Electron-stimulated desorption (ESD) studies on MIB in the condensed phase showed desorption peaks at around 2 and 9 eV electron energies. The gas-phase study on MIB showed that the monomer followed the dissociative ionization (DI) fragmentation pathway, under single collision conditions, which opened up at electron energies above about 11 eV. No signs of dissociative electron attachment (DEA) were detected for MIB in the gas phase under single collision conditions. However, DEA was an active process in MAA in the gas phase under single collision conditions at around 2 eV, showing that slight modifications of the molecular structures of photoresists may serve to sensitize them to certain electron-induced processes.

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Source Journal

Physical Chemistry Chemical Physics

Physical Chemistry Chemical Physics
CiteScore: 5.5
Self-citation Rate: 10.3%
Articles per Year: 3036

Physical Chemistry Chemical Physics (PCCP) is an international journal co-owned by 19 physical chemistry and physics societies from around the world. This journal publishes original, cutting-edge research in physical chemistry, chemical physics and biophysical chemistry. To be suitable for publication in PCCP, articles must include significant innovation and/or insight into physical chemistry; this is the most important criterion that reviewers and Editors will judge against when evaluating submissions. The journal has a broad scope and welcomes contributions spanning experiment, theory, computation and data science. Topical coverage includes spectroscopy, dynamics, kinetics, statistical mechanics, thermodynamics, electrochemistry, catalysis, surface science, quantum mechanics, quantum computing and machine learning. Interdisciplinary research areas such as polymers and soft matter, materials, nanoscience, energy, surfaces/interfaces, and biophysical chemistry are welcomed if they demonstrate significant innovation and/or insight into physical chemistry. Joined experimental/theoretical studies are particularly appreciated when complementary and based on up-to-date approaches.

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