A self-propagating system for Ge incorporation into nanostructured silica

Literature Information

Publication Date 2008-08-04
DOI 10.1039/B804955F
Impact Factor 6.222
Authors

Aubrey K. Davis, Mark Hildebrand


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Abstract

Technologically-relevant levels of Ge can be incorporated into cell wall silica of the diatom Thalassiosira pseudonana with no aberration in structure at low levels, whereas higher levels alter structure.

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