Nitric acid, indium(3+) salt, hydrate (9CI)(CAS: 207398-97-8)

The compound Nitric acid, indium(3+) salt, hydrate is a crystalline hydrate with a molecular weight of approximately 320.03 g/mol. It is highly soluble in water and exhibits weak acidity. The compound is moderately reactive and stable under normal conditions, but it can undergo hydrolysis in the presence of water or acids. It has a low melting point and is typically used in analytical chemistry and semiconductor manufacturing.

Nitric acid, indium(3+) salt, hydrate is typically synthesized through the reaction of nitric acid with indium metal or indium oxide in the presence of a catalyst, such as sulfuric acid. The reaction yields a hydrate that can be crystallized and purified. The process is carried out under controlled conditions to ensure selectivity and high yield, with a focus on maintaining the structural integrity of the indium salt.

Nitric acid, indium(3+) salt, hydrate is primarily used in the semiconductor industry for etching and cleaning processes. It is also utilized in the manufacture of electronic components, where its stability and reactivity make it suitable for precise applications. Additionally, it finds applications in analytical chemistry for sample preparation and in some pharmaceutical processes for the synthesis of certain compounds.

When handling Nitric acid, indium(3+) salt, hydrate, it is essential to wear appropriate personal protective equipment (PPE), including gloves, goggles, and a lab coat. The compound should be stored in a cool, dry place away from direct sunlight. It should be handled in a well-ventilated area or a fume hood to minimize exposure to fumes. In the event of a spill, it is recommended to use appropriate spill cleanup protocols, and the safety data sheet (SDS) should be consulted for detailed instructions.