Towards superlubricity in nanostructured surfaces: the role of van der Waals forces

Literature Information

Publication Date 2018-07-27
DOI 10.1039/C8CP02508H
Impact Factor 3.676
Authors

Fernando G. Echeverrigaray, Saron R. S. de Mello, Leonardo M. Leidens, Marcelo E. H. Maia da Costa, Fernando Alvarez


View Original

Abstract

Hydrogenated amorphous carbon (a-C:H) thin films have a unique combination of properties that are fundamental in mechanical and electromechanical devices aimed at energy efficiency issues. The literature brings a wealth of information about the ultra-low friction (superlubricity) mechanism in a-C:H thin films. However, there is persistent controversy concerning the physicochemical mechanisms of contact mechanics at the atomic/molecular level and the role of electrical interactions at the sliding interface is still a matter of debate. We find that the hydrogenation of the outermost nanostructured surface atomic layers of a-C:H thin films is proportional to the surface potential and also to the friction forces arising at the sliding interface. A higher hydrogen-to-carbon ratio reduces the surface potential, directly affecting frictional forces by a less effective long-term interaction. The structural ultra-low friction (superlubricity) is attributed to a lower polarizability at the outermost nanostructured layer of a-C:H thin films due to a higher hydrogen density, which renders weaker van der Waals forces, in particular London dispersion forces. More hydrogenated nanodomains at the surface of a-C:H thin films are proposed to be used to tailor superlubricity.

Related Literature

Back matter

Front/Back Matter

DOI: 10.1039/B805402A

Stabilization of cobalt oxyhydrate superconductor

Zhi Ren, Cao Wang, Xiang-fan Xu, Guang-han Cao, Zhu-an Xu, Yu-heng Zhang

2008-03-03 Communication

DOI: 10.1039/B800378E

Use of ionic liquids (ILs) for the IL-anion size-dependent formation of Cr, Mo and W nanoparticles from metal carbonyl M(CO)6 precursors

Engelbert Redel, Ralf Thomann, Christoph Janiak

2008-03-14 Communication

DOI: 10.1039/B718055A

Mild electrophilic trifluoromethylation of secondary and primary aryl- and alkylphosphines using hypervalent iodine(iii)–CF3 reagents

Patrick Eisenberger, Iris Kieltsch, Nicolas Armanino, Antonio Togni

2008-03-03 Communication

DOI: 10.1039/B801424H

Highly luminescent mono- and multilayers of immobilized CdTe nanocrystals: controlling optical properties through post chemical surface modification

Takaaki Tsuruoka, Rena Takahashi, Toshihiro Nakamura, Minoru Fujii, Kensuke Akamatsu, Hidemi Nawafune

2008-01-29 Communication

DOI: 10.1039/B717732A

Mutual induced coordination in halogen-bonded anionic assemblies with (6,3) cation-templated topologies

Pierangelo Metrangolo, Frank Meyer, Tullio Pilati, Giancarlo Terraneo

2008-01-14 Communication

DOI: 10.1039/B716879A

Asymmetric oxidation of sulfides under solvent-free or highly concentrated conditions

Kazuhiro Matsumoto, Tetsufumi Yamaguchi, Tsutomu Katsuki

2008-02-05 Communication

DOI: 10.1039/B719265G

Amplified nitric oxide photorelease in DNA proximity

Fiorella L. Callari, Salvatore Sortino

2008-03-20 Communication

DOI: 10.1039/B800132D

Lewis acid-catalyzed hydrogenation: B(C6F5)3-mediated reduction of imines and nitriles with H2‡

Preston A. Chase, Titel Jurca, Douglas W. Stephan

2008-03-06 Communication

DOI: 10.1039/B718598G

A dinuclear ruthenium(ii) complex that functions as a label-free colorimetric sensor for DNA

Veronica Gonzalez, Tom Wilson, Izumi Kurihara, Arata Imai, Jim A. Thomas, Joe Otsuki

2008-03-20 Communication

DOI: 10.1039/B802073F

You might also like

Compound Q&A

What precautions should be taken when handling 4-Methyl-6-(trifluoromethyl)quinoline (CAS: 40716-16-3)?

When handling 4-Methyl-6-(trifluoromethyl)quinoline (CAS: 40716-16-3), safety go...

40716-16-34-Methyl-6-(trifluor...
Compound Q&A

What is 4-(3,5-Difluorophenyl)aniline (CAS: 405058-00-6)?

4-(3,5-Difluorophenyl)aniline is an aromatic organic compound with the CAS numbe...

405058-00-64-(3,5-Difluoropheny...
Compound Q&A

How is 5-{[4-(Trifluoromethyl)phenyl]sulfanyl}-1,2,3-thiadiazole-4-carboxylic acid (CAS: 338982-07-3) typically synthesized?

5-{[4-(Trifluoromethyl)phenyl]sulfanyl}-1,2,3-thiadiazole-4-carboxylic acid can ...

338982-07-35-{[4-(Trifluorometh...
Compound Q&A

What is the market or research trend for 4-Benzylaniline hydrochloride (CAS: 6317-57-3)?

The market for 4-Benzylaniline hydrochloride (CAS: 6317-57-3) is steadily growin...

6317-57-34-Benzylaniline hydr...
Compound Q&A

Is [3-(Diethylsulfamoyl)phenyl]boronic acid (CAS: 871329-58-7) safe?

[3-(Diethylsulfamoyl)phenyl]boronic acid is generally considered safe when handl...

871329-58-7[3-(Diethylsulfamoyl...
Compound Q&A

What are the main uses of 3-Bromo-2,5-dimethoxyaniline (CAS: 115929-62-9)?

3-Bromo-2,5-dimethoxyaniline is mainly used in the pharmaceutical and chemical i...

115929-62-93-Bromo-2,5-dimethox...
Compound Q&A

What regulatory guidelines apply to N-Methyl-1-(5-methyl-1H-indol-3-yl)methanamine (CAS: 915922-67-7)?

N-Methyl-1-(5-methyl-1H-indol-3-yl)methanamine (CAS: 915922-67-7) is subject to ...

915922-67-7N-Methyl-1-(5-methyl...
Compound Q&A

What industries use Carbamic acid, N-[(5S)-5,6-diamino-6-oxohexyl]-, 1,1-dimethylethyl ester (CAS: 24828-96-4)?

This compound is primarily used in the pharmaceutical industry for the synthesis...

24828-96-4Carbamic acid, N-[(5...
Compound Q&A

How should 2-Methyl-2-propanyl [(1S,3R)-3-aminocyclohexyl]carbamate (CAS: 1298101-47-9) be stored?

2-Methyl-2-propanyl [(1S,3R)-3-aminocyclohexyl]carbamate (CAS: 1298101-47-9) sho...

1298101-47-92-Methyl-2-propanyl ...
Compound Q&A

What industries use Ethyl 2-bromo-4,4,4-trifluorobutanoate (CAS: 367-33-9)?

Ethyl 2-bromo-4,4,4-trifluorobutanoate (CAS: 367-33-9) is utilized in the pharma...

367-33-9Ethyl 2-bromo-4,4,4-...

Source Journal

Physical Chemistry Chemical Physics

Physical Chemistry Chemical Physics
CiteScore: 5.5
Self-citation Rate: 10.3%
Articles per Year: 3036

Physical Chemistry Chemical Physics (PCCP) is an international journal co-owned by 19 physical chemistry and physics societies from around the world. This journal publishes original, cutting-edge research in physical chemistry, chemical physics and biophysical chemistry. To be suitable for publication in PCCP, articles must include significant innovation and/or insight into physical chemistry; this is the most important criterion that reviewers and Editors will judge against when evaluating submissions. The journal has a broad scope and welcomes contributions spanning experiment, theory, computation and data science. Topical coverage includes spectroscopy, dynamics, kinetics, statistical mechanics, thermodynamics, electrochemistry, catalysis, surface science, quantum mechanics, quantum computing and machine learning. Interdisciplinary research areas such as polymers and soft matter, materials, nanoscience, energy, surfaces/interfaces, and biophysical chemistry are welcomed if they demonstrate significant innovation and/or insight into physical chemistry. Joined experimental/theoretical studies are particularly appreciated when complementary and based on up-to-date approaches.

Recommended Suppliers

Disclaimer
This page provides academic journal information for reference and research purposes only. We are not affiliated with any journal publishers and do not handle publication submissions. For publication-related inquiries, please contact the respective journal publishers directly.
If you notice any inaccuracies in the information displayed, please contact us at support@chemtradehub.com. We will promptly review and address your concerns.