Reaction control of tetraethyl orthosilicate (TEOS)/O3 and tetramethyl orthosilicate (TMOS)/O3 counter diffusion chemical vapour deposition for preparation of molecular-sieve membranes

Literature Information

Publication Date 2000-09-15
DOI 10.1039/B004642F
Impact Factor 3.676
Authors

Takeo Yamaguchi, Xin Ying, Yasuhiko Tokimasa, Balagopal N. Nair, Takashi Sugawara, Shin-ichi Nakao


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Abstract

Counter diffusion chemical vapour deposition (CVD) is an excellent way to prepare inorganic thin films or membranes on the surface of porous or non-porous supports. Modification of the pore size of porous supports by this method to prepare molecular-sieve membranes is another interesting opportunity. However, control of the deposition profile is very difficult because of the complex reaction kinetics. In this study, counter diffusion CVD of tetraethyl orthosilicate (TEOS)/O3 or tetramethyl orthosilicate (TMOS)/O3 systems was investigated. To control the deposition layer profile in a thin porous ceramic substrate, numerical simulations of the reaction sequences were performed. The reactant concentration and temperature were varied to control the deposition profile, and the simulation results were compared with experimental results. It is shown that high quality membranes can be processed under the optimised reaction conditions. In addition, the effect of step-coverage of the CVD reaction on final membrane performance was also investigated by comparison of the TEOS/O3 and TMOS/O3 reactions.

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Physical Chemistry Chemical Physics

Physical Chemistry Chemical Physics
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Physical Chemistry Chemical Physics (PCCP) is an international journal co-owned by 19 physical chemistry and physics societies from around the world. This journal publishes original, cutting-edge research in physical chemistry, chemical physics and biophysical chemistry. To be suitable for publication in PCCP, articles must include significant innovation and/or insight into physical chemistry; this is the most important criterion that reviewers and Editors will judge against when evaluating submissions. The journal has a broad scope and welcomes contributions spanning experiment, theory, computation and data science. Topical coverage includes spectroscopy, dynamics, kinetics, statistical mechanics, thermodynamics, electrochemistry, catalysis, surface science, quantum mechanics, quantum computing and machine learning. Interdisciplinary research areas such as polymers and soft matter, materials, nanoscience, energy, surfaces/interfaces, and biophysical chemistry are welcomed if they demonstrate significant innovation and/or insight into physical chemistry. Joined experimental/theoretical studies are particularly appreciated when complementary and based on up-to-date approaches.

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